Vistec highlights E-Beam advances
Vistec will showcase new electron-beam lithography developments and recent customer milestones at EMLC 2026, as demand grows for photonics and advanced semiconductor manufacturing.
Vistec Electron Beam GmbH will present its latest electron-beam (e-beam) lithography technologies at the 41st European Mask and Lithography Conference (EMLC 2026) in Jena, Germany, highlighting growing adoption across photonics, advanced semiconductors and research applications.
The company will showcase advances in its Variable Shaped Beam (VSB) lithography platforms, which are designed to improve throughput and patterning flexibility for applications including photonic integrated circuits, micro-optics, AR/VR waveguides, MEMS/NEMS and quantum technologies.
Alongside its technology updates, Vistec is marking 30 years as a company and more than 60 years of e-beam expertise.
Recent milestones include the installation of an SB255 system at The University of Tokyo, continued expansion in Taiwan with a 300 mm e-beam lithography system deployment at the Taiwan Semiconductor Research Institute (TSRI), and additional customer engagements across Europe and the United States.
The company said demand for flexible, high-resolution lithography solutions continues to grow as photonics and advanced semiconductor devices become increasingly complex.
Vistec will also contribute several technical presentations at EMLC 2026, including sessions focused on waveguide fabrication, Cell Projection technology and advanced grayscale lithography techniques.
