La Luce Cristallina launches CMOS-compatible oxide pseudo-substrate for scalable silicon integration
La Luce Cristallina has launched a new CMOS-compatible oxide pseudo-substrate that enables high-quality epitaxial strontium titanate (SrTiO₃) films to be grown directly on 200-mm silicon and silicon-on-insulator wafers, addressing a key scalability challenge for oxide electronics and silicon photonics.
The platform replaces costly, small single-crystal substrates with large-area wafers compatible with standard semiconductor tools, supporting epitaxial film thicknesses from 4 to 50 nm and aligning with foundry roadmaps for heterogeneous integration and wafer-level prototyping.
Target applications include superconducting RF electronics, ultra-low-loss RF components, single-photon detectors, quantum sensing and advanced computing architectures.
According to the company, the approach bridges the gap between academic research and commercial manufacturing by improving cost, yield and tool compatibility, enabling oxide-based devices to transition from lab-scale demonstrations to manufacturable systems.
