Info
Info
News Article

Korean Team Makes 2D Light-emitting FETs

News

Multi-operation mode light-emitting field-effect transistor based on graphene and monolayer WSe2

2D transition metal dichalcogenides (TMDs) are promising materials for next-generation optoelectronic devices. They can emit strong light due to the large binding energies of excitons (quasiparticles composed of electron-hole pair) as well as an atomically thin nature.

In existing 2D light emitting devices, however, the simultaneous injection of electrons and holes into 2D materials has been challenging, which results in low light emission efficiency.

To overcome these problems, Gwan-Hyoung Lee's group in Seoul National University and Chul-Ho Lee's group in Korea University demonstrated all-2D light-emitting field-effect transistors (LEFETs) by staking 2D materials. They chose graphene and monolayer WSe2 as contact electrode and an ambipolar channel, respectively.

Typically, a junction between metal and semiconductor has a large energy barrier. It is the same at a junction of graphene and WSe2. However, Lee group used the barrier-tuneable graphene electrode as a key for the selective injection of electrons and holes. Since the work function of graphene can be tuned by an external electric field, the contact barrier height can be modulated in the graphene-contacted WSe2 transistor, enabling selective injection of electrons and holes at each graphene contact.

By controlling the densities of injected electrons and holes, the high efficiency of electroluminescence as high as 6 percent was achieved at room temperature.

In addition, the researchers showed that, by modulating the contacts and channel with separate three gates, the polarity and light emission of LEFETs can be controlled, showing great promises of the all-2D LEFETs in multi-digit logic devices and highly integrated optoelectronic circuitry.

'Multioperation mode light-emitting field-effect transistors based on van der Waals heterostructure' by Junyoung Koon et al; Advanced Materials, September 2020.

PIC International to return to Brussels – bigger and better than ever!


The leading global integrated photonics conference and exhibition will once again bring together key players from across the value chain for two-days of strategic technical sessions, dynamic talks and unrivalled networking opportunities.


Join us face-to-face on 9-10 November 2021

  • View the agenda.
  • 3 for the price of 1. Register your place and gain complementary access to TWO FURTHER industry leading conferences: CS International and SSI International.
  • Email info@picinternational.net  or call +44 (0)24 7671 8970 for more details.

*90% of exhibition space has gone - book your booth before it’s too late!

Register


×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
×
Logo
×
Register - Step 1

You may choose to subscribe to the PIC Magazine, the PIC Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in:
 
X
Info
X
Info
{taasPodcastNotification}
Live Event