Loading...
News Article

European team makes high-efficiency laser for silicon chips

News

Laser made of germanium and tin has efficiency comparable with conventional GaAs lasers

Scientists from Forschungszentrum Jülich say they have come a step closer to integrating lasers directly in silicon Together with researchers from Centre de Nanosciences et de Nanotechnologies (C2N) in Paris and the French company STMicroelectronics as well as CEA-LETI Grenoble, they have developed a compatible semiconductor laser made of germanium and tin, whose efficiency is comparable with conventional GaAs semiconductor lasers on Si. (Nature Photonics, DOI: 10.1038/s41566-020-0601-5)

Optical data transfer permits much higher data rates and ranges than current electronic processes while also using less energy. Computation and data centres, therefore, already default to optical fibre whenever cables exceed a length of about one metre. In future, optic solutions will be in demand for shorter and shorter distances due to increasing requirements, for example board to board or chip to chip data transfer. This applies particularly to artificial intelligence (AI) systems where large data volumes must be transferred within a large network in order to train the chip and the algorithms.

"The most crucial missing component is a cheap laser, which is necessary to achieve high data rates. An electrically pumped laser compatible with the silicon-based CMOS technology would be ideal," explains Detlev Grützmacher, director at Forschungszentrum Jülich's Peter Grünberg Institute (PGI-9). "Such a laser could then simply be shaped during the chip manufacturing process since the entire chip production is ultimately based on this technology".

"Laser components are currently manufactured externally and must be integrated subsequently, which makes the technology expensive," explains Grützmacher.

In contrast, the new laser can be manufactured during the CMOS production process. Back in 2015, Jülich researchers showed that laser emission can be obtained in GeSn system. The decisive factor in this is the high tin content: back then, it amounted to 12 percent, which is far above the solubility limit of 1 percent .

"Pure germanium is, by its nature, an indirect semiconductor like silicon. The high concentration of tin is what turns it into a direct semiconductor for a laser source," explains Dan Buca, working group leader at Jülich's Peter Grünberg Institute (PGI-9).

The patented epitaxial growth process developed by Jülich is used by several research groups all over the world. By further increasing the tin concentration, lasers have already been made that work not only at low temperatures but also at 0degC.

"A high tin content, however, decreases the laser efficiency. The laser then requires a relatively high pumping power. At 12-14 percent tin, we already need 100-300 kW/cm2," explains Nils von den Driesch. "We thus tried to reduce the concentration of tin and compensate this by additionally stressing the material, which considerably improves the optical properties."

For the new laser, the researchers reduced the tin content to approximately 5 percent - and simultaneously decreased the necessary pumping power to 0.8 kW/cm2. This produces so little waste heat that this laser is the first group IV semiconductor laser that can be operated not only in a pulsed regime but also in a continuous working regime, i.e. as a "continuous-wave laser".

"These values demonstrate that a germanium-tin laser is technologically feasible and that its efficiency matches that of conventional III-V semiconductor lasers grown on Si. This also brings much closer to an electrical pumped laser for industrial-application that works at room temperature," explains institute head Grützmacher. The new laser is currently limited to optical excitation and low temperatures of about -140degC.

Such a laser would be interesting not only for optical data transfer but also for a variety of other applications since there are hardly any cheap alternatives for the corresponding wavelengths in the infrared range of 2-4 μm. Potential applications range from infrared and night-vision systems all the way to gas sensors for monitoring the environment in climate research or even breath gases analyses for medical diagnosis.

'Ultra-low-threshold continuous-wave and pulsed lasing in tensile-strained GeSn alloys' by Anas Elbaz et al; Nature Photonics (2020)

Lightwave Logic receives ECOC Innovation Award for Hybrid PIC/Optical Integration Platform
Coherent wins ECOC award for datacentre innovation
HyperLight announces $37 million funding round
Jabil expands silicon photonics capabilities
Ephos raises $8.5 million for glass-based photonic chips
Designing for manufacture: PAM-4 transmitters using segmented-electrode Mach-Zehnder modulators
OpenLight and Epiphany partner on PIC ecosystem
NewPhotonics and SoftBank team up on advanced photonics
POET and Mitsubishi collaborate on 3.2T optical engines
Integrated photonic platforms: The case for SiC
Integrating high-speed germanium modulators with silicon photonics and fast electronics
Lightium Secures $7 Million Seed Funding
Revolutionising optoelectronics with high-precision bonding
Fraunhofer IMS invites participation in PIC engineering runs
Advances in active alignment engines for efficient photonics device test and assembly
Aeva announces participation at IAA Transportation 2024
Sumitomo Electric announces participation in ECOC 2024
Quside receives NIST certification for quantum entropy source
DustPhotonics launches industry-first merchant 1.6T silicon photonics engine
Arelion and Ciena announce live 1.6T wave data transmission
DGIST leads joint original semiconductor research with the EU
POET Technologies reorganises engineering team
A silicon chip for 6G communications
South Dakota Mines wins $5 million from NSF for Quantum Materials Institute
HieFo indium phosphide fab resumes production
Coherent launches new lasers for silicon photonics transceivers
AlixLabs wins funding from PhotonHub Europe
Sandia National Labs and Arizona State University join forces
Perovskite waveguides for nonlinear photonics
A graphene-based infrared emitter
Atom interferometry performed with silicon photonics
A step towards combining the conventional and quantum internet

×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
x
Logo
×
Register - Step 1

You may choose to subscribe to the PIC Magazine, the PIC Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in: