Synopsys, PhoeniX To Present PIC Design Workshop
A few spaces remain for a two-day Synopsys and PhoeniX Software workshop exploring the latest tools for electro-photonic design automation (EPDA) at the PIC International Conference, 10-11 April at the Sheraton Brussels Airport Hotel. Participation is capped at 36 attendees to ensure ample access to instructors. Participants will learn how to use the latest photonic integrated circuit (PIC) automation and optimization techniques for design, simulation and fabrication.
According to Niek Nijenhuis, global business development manager of Synopsys’ PhoeniX OptoDesigner products, the workshop is aimed at application and R&D engineers as well as managers interested in understanding PIC development. Nijenhuis added that the workshop is also ideal for engineers presently working in compound semiconductor technologies or related fields who wish to dive deeply into practical methodologies and tools for creating and optimizing PIC designs.
The latest Synopsys/PhoeniX PIC EPDA tools have seen widespread industry adoption. As announced on 5th April by CEA-Leti, their photonics process design kit (PDK) is available in the Synopsys OptoDesigner suite. Leti – a leader in silicon photonics technology – has developed its platform for high-speed optical transceivers and highly-integrated optical interposer applications. Leti’s PDK contains design rules and building blocks for multi-project wafer and custom runs on their Si310 platform. The PDK also includes a catalogue of components available at Leti, allowing Synopsys PhoeniX OptoDesigner customers to select elements as needed when building new circuits. Once customers have a completed circuit design, Leti will produce a proof of concept on a multi-project wafer run; contact Leti for more complete details.
The upcoming PIC training workshop will provide an overview of software tools and their roles in creating integrated photonic circuits and manufacturing those devices. Synopsys will describe its photonic tool chain, which features the OptSim Circuit for schematic-driven PIC design, as well as the RSoft Photonic Component Design Suite for device design and custom generation of process design kit (PDK) components that can be used in OptSim Circuit and PhoeniX Software OptoDesigner. PhoeniX Software will describe OptoDesigner, a comprehensive tool for PIC design and mask generation that naturally interfaces with OptSim Circuit for full PDK-driven and custom PIC design.
The second half of the workshop will feature live training and hands-on demonstration of the Synopsys and PhoeniX Software tools explored during day one. The top-down training will demonstrate OptSim Circuit for PIC schematic entry and simulation; PhoeniX Software OptoDesigner for PIC layout and mask generation (including its interface with OptSim Circuit); and the RSoft Photonic Component Design Suite for custom PDK development and device design. During the hands-on sessions, attendees will have the opportunity to work directly with the software under the guidance of technical staff from both companies.
Registration for the two-day workshop is limited to a maximum of 36 attendees; a small number of spaces are still available. The delegate package price of €295 (plus VAT) includes break time refreshments and a buffet luncheon on both days; a pre-conference drinks reception on 9th April and the main conference networking dinner drinks reception on 10th April as well as access to the main exhibition hall on the 10th. For more information or to register, please utilize the following URL in a web browser of your choosing: http://training.picinternational.net/